发明名称 Semiconductor apparatus with transportable edge ring for substrate transport
摘要 An apparatus and method for processing semiconductor substrates provides a substrate stage being a rotatable disc with a solid surface and a terraced edge with upper, intermediate and lower portions of increasing diameter. A hollow edge ring rests on the intermediate edge portion and a substrate disposed on the rotatable disc is lifted and transported by robot blades positioned beneath the edge ring and which lift the edge ring which holds the substrate around its edges. The rotatable disc and edge ring find application in MOCVD and other semiconductor manufacturing tools.
申请公布号 US9425077(B2) 申请公布日期 2016.08.23
申请号 US201313859114 申请日期 2013.04.09
申请人 Taiwan Semiconductor Manufacturing Co., Ltd. 发明人 Hsieh Chih-Chang;Lin Yung-Kai;Liu Hsu-Shui;Lo Kai;Chen Chih-Ping;Chan Chian-Kun;Hsu Chung-Chieh;Chang Chih-Kuo;Hsiao Wei-Ting
分类号 H01L21/687;C23C16/458 主分类号 H01L21/687
代理机构 Duane Morris LLP 代理人 Duane Morris LLP
主权项 1. An apparatus for processing semiconductor substrates, said apparatus comprising: a rotatable disc capable of receiving a semiconductor substrate thereon and having a terraced outer edge having an upper edge portion with a smaller upper outer diameter than a lower outer diameter of a lower edge portion, wherein said substrate contacts said disc while said disc is rotating; a susceptor adapted to receive said rotatable disc thereon or therein; and an edge ring extending circumferentially around a periphery of said rotatable disc and configured to rest on a top surface of said lower edge portion, said edge ring including a horizontal surface capable of receiving a peripheral edge of said substrate thereon and a vertical portion disposed peripherally outside said horizontal surface.
地址 Hsin-Chu TW
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