发明名称 Heat treatment apparatus
摘要 A heat treatment apparatus performs a heat treatment on a plurality of target objects held by a holding unit while allowing an inert gas to flow upwardly in a vertical processing container with at least one heating unit provided in the vicinity of the processing container. The heat treatment apparatus includes: a main temperature control unit configured to control the heating unit; an inert gas passage through which the inert gas flows into the processing container; an inert gas heating unit installed in the inert gas passage and configured to heat the inert gas; a first temperature measuring unit installed in the inert gas heating unit; and a temperature controller configured to control the inert gas heating unit based on temperatures measured by the first temperature measuring unit.
申请公布号 US9425074(B2) 申请公布日期 2016.08.23
申请号 US201313922450 申请日期 2013.06.20
申请人 TOKYO ELECTRON LIMITED 发明人 Asari Shinji;Sato Hidekazu;Shiobara Tomohiro
分类号 F26B19/00;H01L21/67 主分类号 F26B19/00
代理机构 Nath, Goldberg & Meyer 代理人 Nath, Goldberg & Meyer ;Meyer Jerald L.
主权项 1. A heat treatment apparatus for performing a heat treatment on a plurality of target objects held by a holding unit by allowing an inert gas to flow upwardly in a vertical processing container with a heating unit provided in the vicinity of the processing container, the apparatus comprising: a main temperature control unit configured to control the heating unit; an inert gas passage through which the inert gas flows into the processing container; an inert gas heating unit installed in the inert gas passage and configured to heat the inert gas; a first temperature measuring unit located in the inert gas heating unit; a heat insulation heater installed along the inert gas passage between the inert gas heating unit and the processing container; a second temperature measuring unit installed in the heat insulation heater; and a temperature controller configured to control the inert gas heating unit and the heat insulation heater based on temperatures measured by the first and second temperature measuring units, wherein when predetermined values of processing temperatures vary during the heat treatment, the temperature controller controls the inert gas heating unit and the heat insulation heater to reflect changes of the predetermined values such that the target objects accommodated in the processing container can have a uniform heat history.
地址 Tokyo JP