| 摘要 |
<p>Photomask compsn. decomposing when irradiated comprises copolymers of the alpha-alkylacrylic series substd. by >=2 halogen atoms and of formula where the R's are 1-10C alkyl substd. by F, Cl or Br, the indices a, a', b, b', c and c' being integers and are 0 or positive; m, n and p are 0 or positive integers, only one of m, n and p being 0. The compsn. is used as a positive photoresist and is degradable by electrons, UV (200-300 nm), X-rays (4-50 Angstroms) and gamma-rays. The compsn. exhibits high resolution and is used for the prodn. of integrated circuits and optics.</p> |
