| 摘要 |
PROBLEM TO BE SOLVED: To provide a multi beam exposure device having beam scanning speed (rotation speed of a rotation polygon mirror) which does not depend on frequency which can be modulated (can be deflected) or the like.SOLUTION: A light source device 12A for injecting an exposure beam LB for exposing a pattern to a radiated body comprises: a light source part for generating seed light which is a source of the exposure beam LB; a fiber light amplification tool 216 to which the seed light enters and which amplifies the seed light; wavelength conversion optical elements 218 and 220 for creating the exposure beam LB from the amplified seed light; and an electric optical element 206 for modulating intensity of the seed light Lse according to an exposure timing of the pattern.SELECTED DRAWING: Figure 17 |
