发明名称 SUBSTRATE TRANSFER METHOD, DEVICE MANUFACTURING METHOD, AND SUBSTRATE TRANSFER DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate transfer method capable of suppressing distortion of a substrate generated when delivering the substrate, a device manufacturing method, and a substrate transfer device.SOLUTION: The substrate transfer method is to transfer a substrate placed on a substrate support member together with the substrate support member. The substrate transfer method is to transfer the substrate by placing the substrate on the substrate support member after supporting a part to be supported of the substrate support member in a state where the substrate support member is bent so that a shape of the substrate support member becomes a shape equivalent to a shape of the substrate support member when being transferred in a state of supporting the substrate.SELECTED DRAWING: Figure 1
申请公布号 JP2016154266(A) 申请公布日期 2016.08.25
申请号 JP20160099531 申请日期 2016.05.18
申请人 NIKON CORP 发明人 KATO MASANORI;TOGUCHI MANABU
分类号 H01L21/677;B65G49/06;G03F7/20 主分类号 H01L21/677
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