发明名称 |
SUBSTRATE TRANSFER METHOD, DEVICE MANUFACTURING METHOD, AND SUBSTRATE TRANSFER DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate transfer method capable of suppressing distortion of a substrate generated when delivering the substrate, a device manufacturing method, and a substrate transfer device.SOLUTION: The substrate transfer method is to transfer a substrate placed on a substrate support member together with the substrate support member. The substrate transfer method is to transfer the substrate by placing the substrate on the substrate support member after supporting a part to be supported of the substrate support member in a state where the substrate support member is bent so that a shape of the substrate support member becomes a shape equivalent to a shape of the substrate support member when being transferred in a state of supporting the substrate.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016154266(A) |
申请公布日期 |
2016.08.25 |
申请号 |
JP20160099531 |
申请日期 |
2016.05.18 |
申请人 |
NIKON CORP |
发明人 |
KATO MASANORI;TOGUCHI MANABU |
分类号 |
H01L21/677;B65G49/06;G03F7/20 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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