发明名称 STAGE POSITIONING SYSTEM AND LITHOGRAPHIC APPARATUS
摘要 A stage positioning system, includes a first body, a second body and a coupling arranged to couple the first body and the second body to each other. The coupling includes a visco-elastic element arranged to couple the first body and the second body to each other. The stage positioning system may further include a sensor to provide a signal representative of a position of the first body. The stage positioning system may further include an actuator to move the first body. The second body may be arranged to couple the actuator and the coupling to each other.
申请公布号 SG11201606276Q(A) 申请公布日期 2016.08.30
申请号 SG11201606276Q 申请日期 2015.01.20
申请人 ASML NETHERLANDS BV 发明人 AANGENENT, WILHELMUS, HENRICUS, THEODORUS, MARIA;KOORNEEF, LUCAS, FRANCISCUS;RUIJL, THEO, ANJES, MARIA;VAN DEN BERG, STANLEY, CONSTANT, JOHANNES, MARTINUS;VAN DER MEULEN, STAN, HENRICUS;VAN EIJK, JAN;WULLMS, PIETER, HUBERTUS, GODEFRIDA;VAN LIESHOUT, RICHARD, HENRICUS, ADRIANUS
分类号 G03F7/20 主分类号 G03F7/20
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