PATTERN FORMING METHOD, PATTERN FORMING DEVICE, AND COMPUTER READABLE STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To improve solubility ratio to an organic solvent between an A-polymer region and a B-polymer region in a block copolymer.SOLUTION: A pattern forming method includes the steps of: forming a film of a block copolymer containing at least two kinds of polymers on a substrate; heating the film of the block copolymer; irradiating the heated film of the block copolymer with UV light in an atmosphere of inert gas; and supplying an organic solvent to the film of the block copolymer irradiated with the UV light.SELECTED DRAWING: Figure 1