发明名称 DEPOSITION APPARATUS FOR GASEOUS PHASE REACTION
摘要 PURPOSE:To prevent the occurrence of a crack on the surface and the exfoliation of a deposition material attached on the surface by forming a rough surface of the member composing such devices as a reactor tube and a board. CONSTITUTION:A near frosted glass and rough inside surface 6a is formed in the inside of the surface of a quartz reactor tube 6 by blowing a quartz powder. If an SiO2 film 7 is precipitated on the reactor tube 6, no crack will cause on the SiO2 film 7 attached to the inside of the surface 6a and the surface 6a and the scattering of the precipitation material contained small pieces of the quartz will not a occur. If the inside of the surface of the stainless steel reactor tube is made rough, the exfoliation of the attached precipitation film is almost eliminated and the crack will not occur for the reactor tube. As the reacted and precipitated thin films, the same effect will be obtained for simplex films such as an Si nitride film, poly Si, phosporus pentaoxide, mixed films, multilayer films and others.
申请公布号 JPS55127021(A) 申请公布日期 1980.10.01
申请号 JP19790035927 申请日期 1979.03.24
申请人 MITSUBISHI ELECTRIC CORP 发明人 ITOU HIROYUKI
分类号 C30B25/08;C23C16/44;H01L21/205;H01L21/31 主分类号 C30B25/08
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