摘要 |
PURPOSE:To protect a blackening film from falling off in the mask, by cleaning a flat mask with at least an alkaline rust-remover used in a substantially final stage of the etching process. CONSTITUTION:Through a shadow mask raw material, many electron beam passing holes are drilled by the method of etching. In a substantially final stage of the etching process that constructs a flat mask, the flat mask is cleaned by at least an alkaline rust-remover. As a rust-remover, may be used, for instance, an alkaline rust-remover including a rust preventive agent of particular chelate agent amine system. |