发明名称 SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
摘要 PURPOSE:To improve the carrier density of impurity and increase the length of the life time of the carrier in a semiconductor device by adding non-monocrystal semiconductor having special crystal grain size with special amount of hydrogen or halogenide. CONSTITUTION:Impurity such as Cd, In, Sb or Te having more than 50 of atomic weight is, for example, added as hydrogen compound or halogenide to non-monocrystal semiconductor having 100Angstrom -10mu of grain size to thus contain hydrogen at maximum 30mol% or halogenide at maximum 5mol%. The semiconductor may, for example, include Si, SiC, Ge, Sn, SixC1-x (where 0.5<x<1), SixGe1-x (where 0<x<1), SixSn1-x (where 0<x<1) as mixture semiconductor. Thus, it can improve the carrier density of the impurity and increase the length of the life time of the carrier in the semiconductor device.
申请公布号 JPS55124272(A) 申请公布日期 1980.09.25
申请号 JP19790032071 申请日期 1979.03.19
申请人 YAMAZAKI SHUNPEI 发明人 YAMAZAKI SHIYUNPEI
分类号 H01L31/04;H01L31/02;H01L31/0368;H01L31/10 主分类号 H01L31/04
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