| 摘要 |
PURPOSE:To obtain the title composition excellent in sensitivity and resolution, crosslinkable without any additive such as a photopolymerization initiator and useful as a heat-resistant photopolymer material for semiconductors, by mixing a specified polyamic acid ester with an azide polymer and, optionally, a sensitizer etc. CONSTITUTION:100pts.wt. polyamic acid ester (A) having repeating units of formula I (wherein R1 is a tetravalent organic group composed of a carboaromatic ring group, a heteroaromatic ring group or the like, R2 is a bivalent organic group containing at least one of said ring groups in the structure, R3 is a group having a -C=C- group crosslinkable with an actinic radiation or the like, and the main chain is ortho or peri to the -COOR3 groups) and having an MW of 1,000-100,000 is mixed with 1-100pts.wt. azide polymer (B) of formula II (wherein R4 is a bivalent organic group containing an aromatic ring group in the structure, and the azide group is directly bonded to the aromatic ring group) and an MW of 100-1,000,000 and, optionally, at most 20pts.wt. photopolymerization initiator, sensitizer, etc. |
