Method for reactivating a residue containing elemental silicon

摘要

A method for utilizing a residue containing elemental silicon in the form of particles having a maximum diameter of 50 microns which comprises heating the residue for at least 15 hours at a temperature of from 100 DEG to 350 DEG C. in the presence of atmospheric air and/or an inert gas and thereafter recycling the treated residue into a process for preparing halosilanes.