| 摘要 |
PURPOSE:To obtain elements of desired shapes at low cost by providing masks corresponding to the base, emitter and collector regions, to be formed in the region of one pellet of a semiconductor substrate, and using them in succession. CONSTITUTION:On the region corresponding to one pellet of a semiconductor substrate covered with an insulating film, first the base regions of four elemens A-D are formed by using one of the masks of specified patterns. Next, by using another mask, windows are opened, and by the photoresist method, emitter contact regions are formed on the base regions of element A and B. Next, by turning this mask 90 deg., contact regions are formed in a similar manner on the base regions of elements C and D. Similarly, a base contact region and others are formed by using different masks. By this, element rgions of desired shapes can be obtained accurately and yields are improved greatly. |
