| 摘要 |
PURPOSE:To enable to be removed the substance stuck on the inner face of window without breaking vacuum and to carry out and a high quality epitaxial growth with a good reproducibility, by closely arranging the evaporation body on the viewing window of semiconductor vapor deposition apparatus and providing the water cooling tube on the cylindrical part of the viewing window. CONSTITUTION:The heating body 2 made of tungsten, is closely fixed on the disk having a space for temperature measurement at the vacuum side of the glass plate 1 of viewing window of semiconductor vacuum vapor deposition apparatus and the cylindrical part is closely sealed by the plate 1 through the seal part 4. Then, the feed terminals 5a, 5b, are connected with the heating body 2 and the cooling tube is provided winding around on the outer circumference between the part 4 and the above terminals. As film stuck on the plate 1, is able to remove in a short time by turning an electric current on the heating body 2 and heating the above-mentioned space at about 300 deg.C and heating of another part of the apparatus is prevented by the tube 6. Contamination in the apparatus by the atmosphere at the time of exchanging the plate 1, is avoided and a high quality epitaxial growth is made possible. |
