发明名称 Process for the regeneration of electroless plating baths.
摘要 <p>A process is provided for regenerating a spent electroless copper plating bath which contains alkali metal salts resulting from the reduction of a water soluble copper salt under copper plating and reducing conditions. The regeneration is effected by means of the electrodialytic transfer of at least a portion of the anions in the spent plating bath through an anionic permselective membrane (18) into the anode compartment (12) of an electrodialytic cell (10). in the preferred embodiment, hydroxyl ions from the cathode compartment (16) of the electrodialytic cell (10) are concurrently transferred through a second anionic permselective membrane (20) to replace the transferred anions, the replacement taking place in a compartment (14) of the electrodialytic cell (10) located between the two anionic permselective membranes (18, 20). E.g., the spent solution to be regenerated is an aqueous solution containing Cu&lt;+&gt;&lt;+&gt;, Na&lt;+&gt;, OH&lt;-&gt;, HCOO&lt;-&gt;, SO4&lt;-&gt;&lt;-&gt;, HCHO and the sodium salt of EDTA.</p>
申请公布号 EP0015737(A1) 申请公布日期 1980.09.17
申请号 EP19800300642 申请日期 1980.03.04
申请人 ELECTROCHEM INTERNATIONAL, INC. 发明人 GRENDA, DAVID W.
分类号 C02F1/469;C23C18/16;C23C18/31;C23C18/40;C23G1/36;C25D21/16;(IPC1-7):25D21/16;01D13/02;23C3/02 主分类号 C02F1/469
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