| 摘要 |
Apparatus for processing exposed lithographic plates in which an exposed plate is continuously fed forward with the exposed face of the plate facing up, developer is delivered onto the upper face of the plate by a nozzle which is traversed back and forth laterally with respect to the path of the plate above the plate to distribute the developer across the upper face of the plate, the developer is rubbed over the upper face of the plate, the plate is sprayed with water, preservative is delivered onto the upper face of the plate by a nozzle which is traversed back and forth along with the developer delivery nozzle to distribute the preservative across the upper face of the plate, and the preservative is rubbed over the upper face of the plate. The plate is fed forward by sets of plate feed rolls. Water is delivered onto certain of these rolls by nozzles which are traversed back and forth along with the developer and preservative delivery nozzles. Developer and preservative are pumped continuously to the respective nozzles from respective supplies, and developer and preservative not delivered onto a plate are collected and returned to the respective supplies. Water used in processing the plates may be filtered and recirculated, and make-up water added as needed.
|
