发明名称 CRYSTAL STRUCTURE HAVING EPITAXIAL TUNNEL
摘要 Epitaxial tunnels may be formed in crystalline bodies of crystalline materials by growth of the material on a substrate having two intersecting crystallographic planes that exhibit rapid epitaxial growth and by maintaining the growth until the structure forming along those planes closes, thereby producing a tunnel. P-n junction structures can be made in semiconductor devices by appropriate techniques.
申请公布号 JPS55118629(A) 申请公布日期 1980.09.11
申请号 JP19800003714 申请日期 1980.01.18
申请人 IBM 发明人 JIYON KAATAA MARINESU
分类号 C30B25/18;C30B29/40;G01D15/18;H01L21/20;H01L21/205;H01L23/473;H01L27/14;H01L29/04;H01L29/06;H01L31/00;H01L31/0264;H01L33/20 主分类号 C30B25/18
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