| 摘要 |
PURPOSE:To improve the adaptability to a reduction processing by incorporating a hydrazide compd. into the title photosensitive material and incorporating a silver bleach restrainer into at least one layer of the nonphotosensitive layers adjacent to the photosensitive silver halide emulsion layers and/or auxiliary photosensitive silver halide emulsion layer contg. the silver at <=1/5 the content of the silver in the entire part of the photosensitive layers. CONSTITUTION:The hydrazide compd. is incorporated into this photosensitive material and the silver bleach restrainer is incorporated into at least one layer of the nonphotosensitive layers adjacent to the photosensitive silver halide emulsion layers and/or auxiliary photosensitive silver halide emulsion layer contg. the silver at <=1/5 the content of the silver in the entire part of the photosensitive layers. The hydrazide compd. to be incorporated into this photosensitive material is expressed by, for example, formula I. In formula, R1 and R2 denote an aryl group or heterocyclic group; R denotes a divalent org. group; (n) denotes 0-6; (m) denotes 0 or 1. The stable and rapid development process is thereby executed and the high-contrast image is obtd. |
