| 摘要 |
PURPOSE:To increase the rate of film formation and permit the formation of good- quality film by stacking two or more sheets of the non-metallic targets for sputtering of the same material and interposing a heat-insulating layer between the targets and cathode. CONSTITUTION:Disc-type targets 17, 19 composed of ceramics, glass, plastics or the like except metals are superposed in two or more sheets and are mounted by way of a ring 20 to the cathode body 11 which is cooled by the cooling water supplied and discharged through pipes 14, 15. Also, a heat-insulating layer is formed between the targets 17, 18 and the cathode body 11 by an O-ring 19. Even when the target 17 thermally breaks by being hit by ions, there is no likelihood of the entry of impurities into the sputtered film because there is the target 18 of the same material on the lower side. In addition, the presence of the heat-insulating layer enables only the target 17 to be elevated of temperature particularly and this increases the rate of film formation and permits reactive sputtering. |
