发明名称 Process for making a composite semiconductor body and semiconductor body so produced.
摘要 <p>Compound semiconductor bodies (13,14) are formed by bonding layers (12) of polycrystalline supporting material to the two opposite faces of a monocrystalline semiconductor wafer (11) and then cutting the semiconductorwafer into two bodies in a plane parallel to said faces. The cut surface of each semiconductor body (13,14) is then polished.</p>
申请公布号 EP0014824(A1) 申请公布日期 1980.09.03
申请号 EP19800100090 申请日期 1980.01.09
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 EDMONDS, HAROLD DONALD;LYONS, VINCENT JAMES;MARKOVITS, GARY
分类号 H01L21/52;B28D1/00;B28D5/00;H01L21/00;H01L21/02;H01L21/302;H01L21/304;H01L21/306;H01L21/78;H01L23/492;(IPC1-7):01L21/02;01L21/70 主分类号 H01L21/52
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