发明名称 Method of increasing the gettering effect in the bulk of semiconductor bodies utilizing a preliminary thermal annealing step
摘要 The gettering effect in the bulk of semiconductor bodies is increased by heating the bodies prior to device processing to a temperature of from 750 DEG -900 DEG C. for from 1-8 hours in order to generate oxygen precipitates in the form of clusters.
申请公布号 US4220483(A) 申请公布日期 1980.09.02
申请号 US19790066593 申请日期 1979.08.14
申请人 INTERNATIONAL BUSINESS MACHINES CORP 发明人 CAZCARRA, VICTOR G
分类号 C30B33/00;H01L21/322;H01L29/167;(IPC1-7):H01L21/32;H01L29/04 主分类号 C30B33/00
代理机构 代理人
主权项
地址