| 摘要 |
PURPOSE:To regenerate a developer without causing hindrances such as defective heat transfer, clogging, etc. due to polymer adhesion by adding a polymerization inhibitor whose b.p. is higher than that of the developer to the developer containing dissolved unhardened photosensitive resin after developing a photopolymerization type photosensitive resin layer and by distilling the inhibitor-added developer. CONSTITUTION:A photopolymerization type photosensitive resin layer is exposed, and the unexposed portion is dissolution-removed with a developer. When the amt. of unhardened photosensitive resin dissolved in the developer is increased, the developer becomes unreusable. So, before the developer is recovered by distillation, a polymerization inhibitor whose b.p. is higher than that of the developer is added, e.g. p-tertiary-butylcatechol in case the developer is based on 1,1,1-trichloroethane. Thus, smooth distillation is enabled without causing hindrances such as lowered heat conductivity and tube clogging due to adhesion of a polymer to a distiller, resulting in saved heat consumption and increased recovering efficiency. The recovered developer can be used like a fresh one. |
