| 摘要 |
PURPOSE:To form a sharp resist image with no residual resist by using methanol or a methanol-containing solution as a developer for a resist made of high molecular material having alpha,beta-unsaturated carboxylic acid derivative groups. CONSTITUTION:A latent image is formed using a resist made of high molecular material having alpha,beta-unsaturated carboxylic acid derivative groups in its molecule and inducing cross linkage on being irradiated with far ultraviolet rays, electron beams, X-rays, etc., e.g. high molecular substance having an MW of about 60,000 and containing two kinds of monomer units of formulae I, II. This image is then developed by dipping in methanol or a methanol-containing solution as a developer. |
