发明名称 |
Electron beam exposure apparatus |
摘要 |
Disclosed is an electron beam exposure apparatus which comprises a first deflection system for deflecting an electron beam emitted from an electron gun and an objective electron lens for converging the deflected electron beam to apply the beam to a workpiece. Interposed between the objective lens and the workpiece is a second deflection system for deflecting the electron beam in parallel with the optical axis of the apparatus.
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申请公布号 |
US4218621(A) |
申请公布日期 |
1980.08.19 |
申请号 |
US19780915869 |
申请日期 |
1978.06.15 |
申请人 |
VLSI TECHNOLOGY RESEARCH ASSOCIATION |
发明人 |
NAKASUJI, MAMORU;SHINOZAKI, TOSHIAKI |
分类号 |
H01J37/30;(IPC1-7):A61K27/02 |
主分类号 |
H01J37/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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