发明名称 PATTERN DEFECTIVENESS INSPECTING DEVICE
摘要 PURPOSE:To inspect on flash and etc. with mono-colour television, by providing on basic material, photomask which is formed with pattern in different colour with basic material, and standard article which is formed on transparent base plate, with opaque standard pattern in same colour with basic material and in same position with a.m. pattern, on inspecting instrument for inspecting defectiveness of photomask pattern made out from semiconductor substance. CONSTITUTION:On base material 21, to-be-inspected photomask 20 which is formed with pattern 22 in different colour with material 21, and standard article 23 which is formed, on transparent base plage 24, with opaque standard pattern 25 in same position with a.m. pattern 22 and in same colour with pattern 21, are arranged in a way fitting both patterns in coincided condition. Light is irradiated from light source 40 and its reflected light is televised by television camera 30 via filter 60 and is discriminated its quality by testing instrument 50. In case material 21 is in transparent, reflection plate 70 in same colour with standard pattern 25, is arranged underneath.
申请公布号 JPS55103725(A) 申请公布日期 1980.08.08
申请号 JP19790011101 申请日期 1979.02.01
申请人 HAJIME SANGYO 发明人 YOSHIDA HAJIME
分类号 H05K3/00;G01N21/93;G01N21/956;G03F1/84;H01L21/027;H01L21/30;H01L21/66 主分类号 H05K3/00
代理机构 代理人
主权项
地址