| 摘要 |
PURPOSE:To obtain high quality film by DC double-pole sputtering by applying negative bias voltage to the base plate holder of the apparatus. CONSTITUTION:In a DC double-pole sputtering apparatus in which a discharge- stabilizing grid is provided between the target holder 1 and the base plate holder 3, the cathode side of the bias power source VB is connected to the base plate holder 3 and the anode side is earthed. When applying negative bias voltage to the base plate holder 3, the surface of film is purified by the impaction of ion and thereby the characteristic properties of a film, e.g., tantalum nitride, etc., formed by sputtering can be raised. |
