发明名称 HEAT TREATMENT JIG OF WAFER
摘要 PURPOSE:To support wafers stably without damaging them in a wafer supporting jig for wafer heat treatment for the production of semiconductor devices by arranging supporting members so that V shape grooves may come to positions to support a wafer by four bisymmetrical points not higher than its center at the highest. CONSTITUTION:Bar shape supporting members 2a, 2b, 2c and 2d on which V shape grooves 1a, 1b ... are formed at prescribed intervals are connected with connecting members 3a, 3b ... arranging and fixing the supporting members so that the V shape grooves may come to positions to support a wafer 4 by four points A, B, C and D which are lower than its center 0 at the highest and are symmetrical with respect to line Y-Y which passes point 0.
申请公布号 JPS5599719(A) 申请公布日期 1980.07.30
申请号 JP19790007101 申请日期 1979.01.26
申请人 HITACHI LTD 发明人 TATEFURU NOBORU;HIROTA KOUICHI
分类号 H01L21/027;G03F7/26;H01L21/205;H01L21/22;H01L21/302;H01L21/31;H01L21/316 主分类号 H01L21/027
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