发明名称 Vacuum coating of substrates - on conveyor passing vacuum chambers with glow discharge polymerisation and metal vapour deposition
摘要 <p>Substrates receive alternately layers of glow-discharge polymer and of metal by passing them from one vacuum chamber with a glow discharge section to a second vacuum chamber with a metal evaporator via a vacuum lock. They are transported on an endless chain which runs over two sprockets and has in each straight strand a glow discharge section. The endless chain has carrier links with sealing blocks between them. This eliminates any possible contact of the substrates with air between the operational stages. Large and rigid substrates can be coated without excessive space requirements. The vacuum lock seals are more simple to produce than for plants with a revolving drum.</p>
申请公布号 DE2900724(A1) 申请公布日期 1980.07.24
申请号 DE19792900724 申请日期 1979.01.10
申请人 SIEMENS AG 发明人 BEHN,REINHARD,DIPL.-PHYS.;HEYWANG,HERMANN,DR.-ING.;PACHONIK,HORST,DIPL.-PHYS.
分类号 C23C14/56;C23C16/54;(IPC1-7):C23C13/10;C23C15/00;C23C11/00 主分类号 C23C14/56
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