| 摘要 |
PURPOSE:To obtain stable discharge plasma in a wide control zone for sputtering voltage and current by providing a discharge-stabilizing grid between target and base plate holder. CONSTITUTION:The discharge-stabilizing grid 7 of stainless steel mesh, etc., is provided between the target 1 and the base plate holder 3, and one end of the grid 7 is connected to the chain bar 2. Thus, in such a DC double-pole sputtering apparatus, discharge plasma is stabilized in a wide control zone and therefore better sputtering film can be obtained. |
