发明名称 Fabrication of injection lasers utilizing epitaxial growth and selective diffusion
摘要 Porous silica doped with zinc is used as a p-type dopant source in the construction of rib lasers. This is preferable to the method used in the parent case of growing a zinc doped layer because epitaxial growth is liable to be accompanied by zinc diffusion into regions where it is not required. Other modifications include allowing the zinc diffusion to go right through the active layer and to dimension the device so that lateral optical guidance is unaffected by the rib.
申请公布号 US4213808(A) 申请公布日期 1980.07.22
申请号 US19780891886 申请日期 1978.03.30
申请人 ITT INDUSTRIES INC 发明人 ABBEY, WALTHAM;LOVELACE, DAVID F;THOMPSON, GEORGE H B
分类号 H01S5/00;H01L33/00;H01S5/042;(IPC1-7):H01L21/22;H01L21/20 主分类号 H01S5/00
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