ETCHING LIQUID FOR SILICON DIOXIDE LAYER,申请号JP19790126927-传众专利搜索

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发明名称	ETCHING LIQUID FOR SILICON DIOXIDE LAYER
摘要
申请公布号	JPS5591131(A)	申请公布日期	1980.07.10
申请号	JP19790126927	申请日期	1979.10.03
申请人	IBM	发明人	JIYOSEFU JIYON GAJIDA
分类号	C09K13/08;H01L21/308;H01L21/311	主分类号	C09K13/08
代理机构		代理人
主权项
地址

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