| 摘要 |
PURPOSE:To carry out uniform treatment of both surfaces of a substrate by a mechanism wherein a shield material is positioned between a pair of electrodes generating low temperature plasma and a substrate to be treated by plasma and an irradiation amount of ultra-violet ray emitted from low temperature plasma to a substrate is reduced. CONSTITUTION:A metal tube 15 having small pores at a lower portion thereof and an electrode 14 provided on a shaft core of a metal tube 15 are provided within a discharge treating chamber 5 and electric discharge is generated between both materials to generate low temperature plasma. Thereby, because an electrode 14 is provided within a metal tube 15, ultraviolet ray generated from low temperature plasma by electric discharge between both electrodes is shielded by a metal tube 15 and an amount irradiated to a substrate 1 is widely reduced. Besides, as a means to reduce ultraviolet ray irradiated to a substrate 1, a metal tube 15 provided with slits at a lower portion thereof may be utilized and a methal screen may be provided around a metal tube 15. |
