发明名称 SYSTEM FOR FINDING DEFECT IN REPEATED PATTERN
摘要 PURPOSE:To simply and certainly find a defect in repeat patterns by taking a picture, by means of a photoline sensor, of electrode patterns on a display panel to be examined while moving the electrode patterns in a direction in which they continue, so as to obtain a signal correspond to the sum of picture elements in every repeat cycle, and then comparing this signal with a reference signal. CONSTITUTION:An electrode substrate 11 to be examined is placed on a longitudinally and transversely movable scan drive means 10, and a CCD photoline sensor 12 for taking a picture of electrode patterns is disposed above the electrode substrate 11. An A/D converter 15 for converting an analog image signal, which is input thereinto from the sensor 12, into a binary is provided, and an output of the A/D converter 15 is connected to a counter 17 through a section signal generator 16. A branch output of the converter 15 is connected to a data memory 20 through an address generator 19. In this structure, light is applied to the electrode substrate 11 so that high level signals and low-level signals are generated in the sensor 12 with respect to patterns A-X in space sections 4 between electrodes and electrode conductor sections 3, respectively. When a defect 6 exists, an abnormality signal is generated or the generation of an abnormality signal indicates the existence of a defect.
申请公布号 JPS5587431(A) 申请公布日期 1980.07.02
申请号 JP19780162500 申请日期 1978.12.26
申请人 FUJITSU LTD 发明人 MORI TADATAMI;NAKAMURA MASAAKI;TOUFUKU ISAO
分类号 G01B11/24;G01B11/30;G06K9/62;G06T1/00;H01L21/027;H01L21/30;H01L21/66 主分类号 G01B11/24
代理机构 代理人
主权项
地址