| 摘要 |
PURPOSE:To obtain a ring type pattern of electron beam by applying a high-speed electron beam while expanding the same to a pattern mask consisting of a permeable secondary electron generating material and an electron shielding material having a predetermined pattern. CONSTITUTION:A permeable secondary electron generating material 3 consisting of KCl is evaporated via an Al conductor 2 on a supporting insulator 1 which can be thinned and which consists of Al2O3 having a high electron beam permeability. An electron beam shielding material 4 consisting of Au is then provided on the secondary electron generating material 3 such as to obtain a predetermined pattern 5, and a pattern mask 6 is applied to an exposed outer surface of the insulator 1. Then, a high-speed electron beam is applied from an electron gun 8 to the mask 6 which expanding the electron beam by electron lens 9-11 to allow a multiplied amount of permeable secondary electron to occur on the whole surface of the secondary electron generating material 3. Since the secondary electron generating material 3 is provided on its outer surface with the electron beam shielding material 4, the secondary electron is generated in the form of a ring from the pattern 5 only. |
