| 摘要 |
PURPOSE:To enable a photomask used to be discriminated by sight when a wafer is observed, by forming a photomask so as to eneable element patterns as well as an information pattern to be transferred on the wafer. CONSTITUTION:A necessary number of element patterns connected to one another, for example, element patterns corresponding to chips 4 in the circumferential part of wafer 3 low in manufacture yield are selected from element patterns 2 drawn on the surface of photomask 1 to form indication (information) pattern 6 in place of them. Indication part 7 discriminable easily by sight is formed in addition to element pattern chips 4 on the wafer 3 printed using photomask 1 having element patterns 2 and indication pattern 6. |
