发明名称 Epitaxial tunnels from intersecting growth planes
摘要 Epitaxial tunnels may be formed in crystalline bodies of crystalline materials by growth of the material on a substrate having two intersecting crystallographic planes that exhibit rapid epitaxial growth and by maintaining the growth until the structure forming along those planes closes, thereby producing a tunnel. P-n junction structures can be made in semiconductor devices by appropriate techniques.
申请公布号 US4210470(A) 申请公布日期 1980.07.01
申请号 US19790048245 申请日期 1979.06.13
申请人 INTERNATIONAL BUSINESS MACHINES CORP 发明人 MARINACE, JOHN C
分类号 G01D15/18;H01L21/20;H01L29/04;H01L29/06;H01L33/20;(IPC1-7):H01L29/04 主分类号 G01D15/18
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