发明名称 FABRICATION OF RECTANGULAR RELIEF PROFILES IN PHOTORESIST
摘要 <p>By providing a given thickness for a positive photoresist layer on a substrate which, if unexposed, after development has a maximum depth just equal to the sum of the individual depths of two, at least partly superimposed, rectungular relief-profile diffraction gratings in the developed photoresist layer, it is possible to make a single master recording, which can be used to provide a stamper for embossing two of the three primary colors in a single surface of a transparent plastic sheet in the fabrication of diffractive subtractive filters.</p>
申请公布号 CA1080009(A) 申请公布日期 1980.06.24
申请号 CA19770270577 申请日期 1977.01.27
申请人 RCA CORPORATION 发明人 KNOP, KARL
分类号 G03B15/00;G02B5/18;G02B5/20;G02B27/42;G03B33/00;G03F7/00;(IPC1-7):02B5/28;02B27/38;02B5/18 主分类号 G03B15/00
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