PYRAZOLOQUNAZOLINE DERIVATIVE*ITS RELATIVE COMPOUND AND THEIR MANUFACTURE

摘要

Compounds are provided having the structure wherein R1 is carboxyl; hydroxymethyl; CO2R3 wherein R3 is lower alkyl, Li+, Na+ or K+; or R2 is hydrogen, lower alkyl, aryl or trifluoromethyl; and X is hydrogen, lower alkyl, lower alkoxy, halogen (Cl, Br and F), or trifluoromethyl. These compounds are useful as anti-allergics.