发明名称 PATTERN PROCESS SYSTEM
摘要 PURPOSE:To secure extraction of the desired information via the corresponding block labelled pattern by forming each white region into blocks with labelling after the process is given to track the outer and/or inner contours of the pattern. CONSTITUTION:The thin-line pattern is obtained by securing the effect of the thin- line mask to the input pattern at thin-line process part 2. Then the tracking is given to both the outer and inner contours of the thin-line pattern at block labelling process part 3, and the white region is divided into blocks. And the label is given to each block. Based on such pattern, the intersections of the pattern strokes are extracted at intersection extraction process part 4 to extract the linkage direction of each intersection and furthermore the peripheral block of each intersection. Then the tracking is given to the linking line from the intersection extracted based on the block labelled pattern through linking line tracking process part 5. Then the extraction is given to the start and finish point coordinates of each linking point as well as the block names and others existing at both sides of the corresponding linking line.
申请公布号 JPS5583977(A) 申请公布日期 1980.06.24
申请号 JP19780159487 申请日期 1978.12.20
申请人 FUJITSU LTD 发明人 OSADA SHIGEMI;MATSUURA TOSHIO;YOSHIDA MASUMI
分类号 G06T3/00;G06K9/36;G06K9/62;G06T7/60 主分类号 G06T3/00
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