发明名称 |
METHOD FOR MANUFACTURING A MASK WITH AN ASPECT RATIO41 |
摘要 |
<p>FABRICATION OF HIGH ASPECT RATIO MASKS A method of constructing masks characterized by a high aspect ratio. The method includes at least a single exposure of a mask by radiation which is transmitted by the substrate before impinging on the resist. In a specific embodiment the mask is partially completed and the already deposited mask modulates the radiation transmitted by the substrate before it exposes the resist.</p> |
申请公布号 |
CA1079566(A) |
申请公布日期 |
1980.06.17 |
申请号 |
CA19760254965 |
申请日期 |
1976.06.16 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
FEDER, RALPH;SPILLER, EBERHARD A. |
分类号 |
H01L21/027;G03F1/22;G03F7/004;G03F7/20;H05K3/00;H05K3/10;(IPC1-7):05D3/06;03C5/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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