发明名称 METHOD FOR MANUFACTURING A MASK WITH AN ASPECT RATIO41
摘要 <p>FABRICATION OF HIGH ASPECT RATIO MASKS A method of constructing masks characterized by a high aspect ratio. The method includes at least a single exposure of a mask by radiation which is transmitted by the substrate before impinging on the resist. In a specific embodiment the mask is partially completed and the already deposited mask modulates the radiation transmitted by the substrate before it exposes the resist.</p>
申请公布号 CA1079566(A) 申请公布日期 1980.06.17
申请号 CA19760254965 申请日期 1976.06.16
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 FEDER, RALPH;SPILLER, EBERHARD A.
分类号 H01L21/027;G03F1/22;G03F7/004;G03F7/20;H05K3/00;H05K3/10;(IPC1-7):05D3/06;03C5/00 主分类号 H01L21/027
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