发明名称 METHOD OF FORMING SCHOTTKY BARRIER UNIT
摘要 A method of forming a self aligned guard ring surrounding a schottky barrier diode device without requiring an enlargement of the final schottky barrier device. The method involves creating an overhanging opening in a insulator layer overlying a semiconductor body to expose the schottky contact area on the surface of the semiconductor body, depositing a diffusion barrier material such as molybdenum in the opening, the deposit being of the same size as the smallest part of the overhanging opening so that a guard ring can be formed from a vapor by diffusion around the deposited barrier material.
申请公布号 JPS5580367(A) 申请公布日期 1980.06.17
申请号 JP19790126929 申请日期 1979.10.03
申请人 IBM 发明人 RICHIYAADO FUOODO DORIIBUZU;JIYON FURANKU FURIIJIA;SANGU UKU KIMU;JIYON JIEEMUZU RAJIYA JIYUNIA
分类号 H01L21/033;H01L21/22;H01L21/28;H01L21/331;H01L21/338;H01L29/47;H01L29/73;H01L29/872 主分类号 H01L21/033
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