Glow discharge appts. for depositing metals on substrate - where carrier gas is fed into turbulence zone of ion generator contg. target so both gas and metal are pre-ionised

摘要

Appts. for depositing a metal or alloy layer onto an electrically conducting substrate by glow discharges, uses a substrate to form one electrode in a vacuum chamber fed with a carrier gas. The gas and the coating metal(s) are pre-ionised in >=1 ion generator contg. a turbulence zone, and from which the gas and metal(s) flow into the vacuum chamber. The other electrode in the system is pref. a flat alloy highly resistant to ionisation, and is esp. the wall of the vacuum chamber. When the deposit is an alloy, an ion generator is pref. used for each constituent of the alloy. The process replaces conventional coating methods such as electroplating which produce drain water and waste polluting the environment. The invention can produce thick deposits without any need to heat the substrates.