| 摘要 |
PURPOSE:To prepare advantageously a pattern-forming material useful as an electron-beam crosslinkable resist in an industrial scale with suppressing gelation during the polymerization, by copolymerizing a methacrylic ester with methacryloyl chloride and hydrolyzing a part of the acid chloride groups. CONSTITUTION:A methacrylic ester having an alkyl, cycloalkyl or aralkyl group is copolymerized with methacryloyl chloride. A part of the carboxylic acid chloride groups in the copolymer is converted to carboxyl groups by hydrolyzing it in a solvent, e.g. dioxane, etc., to give the desired copolymer. A resist is obtained by coating the solution of the copolymer on a wafer and prebacking thereof to crosslink. |
