发明名称 METHOD AND APPARATUS FOR GRINDING WAFER
摘要 PURPOSE:To reduce vibrations and shocks such as striking of ground particles in grinding works and to prevent yields of scraches caused by rubbing, by intervening a flexible thin film between a fixing table and a wafer, in the case the wafer which is fixed by the fixing table is ground by a grindstone. CONSTITUTION:A fixing table 6 having a plurality of air holes 9 is fixed to a chuck-base plate 8 by fixing screws 7, and flexible thin film 11 having a plurality of slits 12 is placed on or bonded to the upper surface of the table 6. The slits 12 are alingned with the holes 9. A wafer 2 is mounted on a the film 11, and is attracted by evacuation of air in an air hole 10, the holes 9, and the slits 12, thereby the film 11 and the wafer 2 are held. Then, the grinding is performed by a rotary grindstone 1.
申请公布号 JPS5571026(A) 申请公布日期 1980.05.28
申请号 JP19780144200 申请日期 1978.11.24
申请人 HITACHI LTD 发明人 TAKAHASHI NOBUAKI;SATOU AKIHIKO;NAKAMURA SOUICHIROU
分类号 B24B7/20;H01L21/304 主分类号 B24B7/20
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