| 发明名称 |
METHOD OF PRODUCING XXRAY MASK |
| 摘要 |
PATENT APPLICATION PAPERS OF Martin J. Casey FOR: METHOD OF MAKING X-RAY MASKS An x-ray mask is made by forming a thin polyimide membrane on a silicon wafer substrate which is then backetched to form a mask supporting ring of the substrate. |
| 申请公布号 |
JPS5569143(A) |
申请公布日期 |
1980.05.24 |
| 申请号 |
JP19790117173 |
申请日期 |
1979.09.12 |
| 申请人 |
SPERRY RAND CORP |
发明人 |
MAACHIN JIEI KIYASHIII |
| 分类号 |
G03F1/00;G03F1/68;G03F1/80;G03F5/00;H01L21/027;H01L21/30 |
主分类号 |
G03F1/00 |
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