| 摘要 |
PURPOSE:To increase the strength of the magnetic field near the surface of a target so as to form a magnetic film at a high speed, by using a cylindrical permanent magnet, which is magnetzed in the direction perpendicular to the axis, within a target for a sputtering unit of coaxial magnetron type. CONSTITUTION:A gas is introduced to a vacuum vessel, which is evacuated by the combination with an exhausting system to a vacuum of 10<-1>-10<-5>torr. In a sputtering unit, where power is supplied to a coaxial magnetic target 11, a coaxial permanent magnet 22 having a magnetic poles perpendicular to the axis and using the surface as the N-pole, and a coaxial permanent magnet 23 using the surface as the S-pole are arranged alternately. The result is that magnetic domains D, E, F having magnetic lines of force shown by arrows 33-36 are formed on the outer periphery of the target 11. By increasing the length of respective magnets corresponding to the magnetic comains D, E, F, the strength of the magnetic field in the axial direction is increased by means of the target 11 and the magnet of proper sizes. |
