| 摘要 |
PURPOSE:To provide a high-accuracy pattern drawing by providing a rate multiplier counter so that an output signal in wavelength unit corresponding to the movement of a stage can be made to a high-approximation of the desired meter unit output. CONSTITUTION:A laser beam from the laser generator 13 passes through the interferometers 15a, 15b and impinges on the corresponding plane mirros 12a, 12b. When the stage 11 moves in the X direction, a Doppler effect occurs to the reflecting beam, which is received by the interferometer 15a and given to the pulse comparator 17a. The comparator 17a uses the laser from the generator 13 as a reference signal and, by bearing this signal and the measuring signal, generates pulses in the unit of wavelength. The output pulses are counted by the multiplier counter 18 and generated as the output pulses in the unit of meter in response to the preset rate data. The output signal is given to the electron beam drawing control system to perform a pattern drawing on the tip of the stage 11. |
