发明名称 |
MAKING METHOD OF REFLECTIONNPREVENTING FILM OF PHOTOELECTRIC CONVERTER |
摘要 |
PURPOSE:To raise the efficiency of light reception, by dipping the light reception face of a photoelectric converter in a mixed solution of hydrofluoric acid and nitric acid at a prescribed ratio when making a reflection-preventing film for the photoelectric converter having a silicon crystal substrate. CONSTITUTION:An n-type layer is produced on a p-type silicon crystal substrate so that a solar battery is manufactured by a conventional method. The solar battery is dipped in a mixed solution of 100 parts by volume of hydrofluoric acid and 0.5- 3.0 parts by volume of nitric acid for several to scores of seconds. As a result, a bluish film is produced on the surface of the solar battery. The film acts to prevent reflection. As for a pn junction type solar battery having an n-type layer on its light reception face, such dipping treatment is effected while an inverse bias of 0.5-0.1V is applied to the pn junction. As for a pn junction type solar battery having a p-type layer on the light reception face, such dipping treatment is effected while strong light is irradiated upon the light reception face. A uniform film is thus produced. |
申请公布号 |
JPS5563881(A) |
申请公布日期 |
1980.05.14 |
申请号 |
JP19780136651 |
申请日期 |
1978.11.08 |
申请人 |
TOKYO SHIBAURA ELECTRIC CO |
发明人 |
IGAWA YASUO;KASHIWAGI FUMIKO;HOUJIYOU AKIMICHI |
分类号 |
G02B1/11;H01L31/0216;H01L31/04 |
主分类号 |
G02B1/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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