| 摘要 |
<p>In apparatus and a process for applying an epitaxial layer to a substrate (5) by means of melt epitaxy without the use of mechanically moving parts, two plate (1, 2) are spaced apart to form a gap (3) between them into which a melt (4) of the material to be deposited is introduced. The plates (1, 2) are of a material which is not wetted by the melt (4), so that the latter is transported by virtue of its surface tension to the substrate (5) which is carried by the lower plate (2). The plates (1, 2) may be parallel to one another, or arranged at an angle, the melt (4) then being introduced at the narrower end of the gap (3). <IMAGE></p> |
