| 摘要 |
PURPOSE:To uniform an accelerating magnetic field and thus to form a high resolution of pattern on a resist provided on a test piece by accelerating an electron beam generated by irradiating ultraviolet rays with an electrode for which Si wafer is foiled. CONSTITUTION:A quartz glass substrate 16 with an IC manufacturing pattern 17 provided on the bottom by way of a thin film 18 is arranged under a plural number of light sources 15 generating ultraviolet rays, an accelerating electrode 20 consisting of Si foils is provided thereunder, and an accelerating voltage from a light source 21 is impressed between the electrode 20 and the thin film 18. Next, an electron beam 19 transmitted through the electrode 20 is irradiated onto a resist 27 for electron beam which is applied on a test piece 26 by means of electromagnetic lenses 22 and 23, a blanker 28, an aperture 24, a deflecting coil 25, etc. For the accelerating electrode 20 in this constitution, an Si support frame 35 made through etching and diffusion and an Si foil consisting of a thin boron diffused layer 33 are used. From this arrangement, dimensions of the beam accelerating magnetic field become uniform. |
